Thin film polarizers feature high laser damage threshold and are designed for the most demanding applications with Nd host lasers operating at 1040-1070 nm range and femtosecond Ti:Sapphire or Yb:KGW/KYW lasers.
Thin Film Polarizers separate s- and p-polarized components of particular wavelength or wavelength range. Due to their high damage threshold reaching 10 J/cm2 at 1064 nm, 10 ns Thin Film Polarizers replace Glan Laser polarizing prisms or cube polarizing beamsplitters in applications with high energy lasers. Thin Film Polarizers are used in high energy lasers.
They can be used for Yb:KGW/KYW or Ti:Sapphire laser fundamental wavelength and its harmonics or as intracavity Q-switch hold-off polarizers. The most efficient way to use thin film laser polarizers is at Brewster angle – 56° ±2 ° with minimal losses.
|Material||BK7, UV Fused Silica|
|Surface Quality||60/40 scratch and dig|
|Flatness||<λfirstname.lastname@example.org per 25mm|
|Parallelism||<3 arc minutes|
|Coating||AOI 56.5deg (Should be tuned to optimized AOI in use), one surface coated, rear surface uncoated|
|Damage threshold||>5J/cm2, 20ns, 20Hz, @1064nm|
- Yb:KGW/KYW or Ti:Sapphire Laser
- Q-switched intracavity polarizer
- Split the S beam and P beam
- Brewster angle of incidence
- Suitable for high power apolication
- RoHS Compliant